Bell System, November 1970, pp 1995-2415 inclusive, diagrams, references, some photographs.
Condition: Very Good, light blue heavy paper covers, softcover journal, table of contents on front cover and inside rear cover, slight spine lean, spine sunned, light corner wear. The binding is sound and secure, the pages are clean, unmarked.
Categories: 1970's computers and computing, Computer Graphics, Computer Music, Computer Graphics, Databooks, Handbooks, Manuals, Hardware, Technical Journals, Proceedings, Conferences, Bell System Technical Journals, BSTJ 1970 - 1979
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Item DescriptionIssue on Device Photolithography includes papers such as, An Overview of the new Mask-Making System(Howland and Poole); Computer Systems for Pattern Generator Control (Gorss, Raamot and Wakins); The Primary Pattern Generator -- Introduction (Poole); Part I - Optical Design (Cowan, Herriott, et al); part II - Mechanical Design (Kossyk, Laico et al); Part III - The Control System (Dowd, Cowan et al); Part IV - Alignment and Performance Evaluation (Johnson and Zacharias);
The Electron Beam Pattern Generator (Samaroo, Raamot,et al); Electron-Sensitive Materials (Broyde); Lenses for the Photolithographic System (Herriott); Reduction Cameras -- Optical design and adjustment (Rawson); The Step-and-Repeat Camera (Alles, Elek, et al); much MORE.